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HORIBA Concentration Monitor
CS-600F Series
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The CS-600F achieves a higher level of functionality best suited for manufacturing, such as the alility to perform in-line measurement of high temperature chemical solutions in various applications, stable operation for reduced downtime, and compact size for improved space productivity in order to meet the precise chemical solution concentration manafement required in leading-edge semiconductor wet process. - Reduced Sizes for More Flexible Layout The CS-600F monitor is compact in size, height has been reduced by 36%, volume by 40%, and the space required by the cell cables by 46% compared to previous models(CS-100F1 series). The light source unit and monitor main body can be installed remotely and in sepatate locations, which allows installation flexibility based on the locations of chemical solution unit and cleaning equipment. - High-stbility, In-line Measurement of High Temperature Chemical Solution(20 to 80℃) The all-new optical system and improved processing algorithms enable in-line measurement of high temperature chemical solutions, a critical step for leading-edge wet processes. This eliminates the need to cool-down the chemical sample., HORIBA's CS-600F provides a high-stability, enables more efficient and precise chemical solution management. - Significantly Reduced Background Correction Frequency The regular correction frquency significantly reduced compared to the previous model(CS-100F1 Series), which in turn significantly reduces unit downtime and greatly contributes to improved throughput. - A Single Monitor is Capable of MeasuringUp to Six Types of Chemical Solutions
(solution types or ranges)
A single monitor can measure up to six types of chemical solutions (solutions types or ranges).
Solution types and rages can be freely specified, enabling the CS-600F to meet a wide variety of monitoring requirements.
- Capable of Outputting Measured Values of Up to Six Components (Serial Output) This previous model(CS-100F1 Series) was able to output four components(serial outoput).
This new model can output up to six components through the serial output. Analog output of new model is four components versus two on the previous model.

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CS-100 Series
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The CS-100 Series offers a complete lineup of high precision chemical solution concentration monitors for various solutions in cleaning and etching processes during semiconductor manufacturing. In addition to be the high-speed response and compact design, measurement of each component concentration is conducted in real-time and the timing of chemical solution changes and automatic supply is warned with an alarm. The ability to perform short measurement cycles allows for accurate monitoring of concentration changes. - Concentration follow-up in real-time Concentration control for the 300mm process with an approximately 3second measurement cycle is achieved.
Frequent feedback is possible for both multi-bath and single-bath cleaning systems.
- Full automatic measurements Measurement is fully automatic, so no measurement control is required once the measurements have begun.
The operator needs only to prepare the chemical solution. In addition, air is used for the reference spectral measurement, so a utility water supply used for usual measurements is unnecessary.
- Comprehensive measure to eliminate air bubble during sequential measurements A unit with air bubble removing capability is installed upstream of the flow cell, allowing for consecutive meansuerments to be taken without abnormalities in the solution flow. - A higher safety assurance by using 24V DC A low voltage 24V DC is used for the power supply, while only being 45W improves electrical power savings and safety by lowering the risk of electrical shock. Support in emergencies is offered as well. A built-in leakage sensor actuates a chemical solution supply cutoff when leaks occur. - Lightweight and compact design Because of the compact design only two-thirds the conventional floor area is needed, so less space is needed for the cleaning device. The monitor is easily integrated with the cleaning device. Because it is lightweight it can be installed on the cleaning device.

Lineup
SC-1(NH3/H2O2) Monitor CS-131
SC-2(HCl/H2O2) Monitor CS-152
SPM(H2SO4/H2O2) Monitor CS-150
BHF(NH4F/HF) Monitor CS-137
FPM(HF/H2O2) Monitor CS-153
HF/HNO3 Monitor CS-153N
TMAH/H2O2 Monitor CS-139E
HF/EG Monitor CS-138
H2SO4/HF Monitor CS-133V
HNO3/HCl Monitor CS-152N
HNO3/CH3COOH/H3PO4 Monitor CS-139J
CS-700 Series
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The CS-700 chemical concentration monitor enables high performance measurement of the individual chemical constituents of complex chemistries used in the leading edge Semiconductor Manufacturing Processes.
By improving HORIBA's renowned spectroscopic measurement technology, the CS-700 realizes up to 5X improvement in measurement performance.
Provides enhanced quality control hich improves the Semiconductor Manufacturing Processes.
- Optimal for measuring complex mixced acid (for BEOL) - Up to 5x measurement performance compared to previous ones - Monitoring max 8 components with real time and high performance - Maintaining the basic functions and structures of the CS-100 series

CS-100 vs CS-700 Precision comparison
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HF Monitor
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CM-200A/210A

The CM-200A/210A provides a real-time readout of hydrofluoric acid concentration through high-precision measuring the electric conductivity of the sample solution. These superior units offer high repeatablility even at low concentrations.

Measurement method Electromagnetic induction method
Measurement range HF 0~1/2/5/10/20/50%, 0~100/200/500/1000mS/cm
Repeatability ±2% of full scale
Response time 90% response within 5seconds
(under constant temperature condition)
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HF-960M

With the evolution of 65nm and 45nm devices, RCA cleaning requires greater and greater low-concentration control. The HF-960M supports this need. It uses sensors that offer outstanding corrosion resistance for high-precision, high-speed measurement of low concentrations of hydrofluoric acid,hydro-chloric acid and ammonia.

Measurement method Carbon flow-through conductivity measurement and concentration conversion
Cell constant Approx. 4/cm
Temperature sensor specifications Platinum resistance 1000℃/0℃ 3850ppm/℃
Measurement range HF 0~5000ppm/0~1000ppm
HCI 0~5000ppm/0~1000ppm
NH3 0~10000ppm/0~2000ppm
Conductivity 0~50.00mS/cm, 0~2.000mS/cm
Temperature 0℃ to 100℃
(Selectable from one and two for the number of digits after decimal point)
Repeatability Within±0.5% of the full scale(in equivalent input)
Linearity Within±0.5% of the full scale(in equivalent input)
Resistivity Meter
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Resistivity Meter
(HE-480R)

The HE-480R's onboard microprocessor calculates the temperature compensation coefficient based on the temperature characteristics of the ultra-pure water and automatically converts it to 25℃ resistivity and precisely measures ultra-pure water during the process.
This allows for highly precise temperature compensation in the rage of 0 to 100℃. The HE-480R provides support for the close monitoring of ultra-pure water that is essential as part of the final process for cleaning silicon wafers.
- Perfect for monitoring resistivity of ultra-pure water in the final rinsing process - Selectable temperature compensation funtion - Selectalbe setting for standard temperature - Simultaneous display of measured and set parameter values - Easy-to-understand icon display and superior security function - CE Marking compliant

Measurement method 2-electrode method
Temperature sensor specifications Platinum resistance 1000Ω/0℃ | Temperature coefficient 3850ppm/℃ standard
Measurement range Resistivity 0~0.200, 0~2.00, 0~20.00, 0~100.0MΩ·cm(0~2.00, 0~20.0, 0~200.0, 0~1000kΩ·m)
* Measurable without temperature compensation
Temperature 0 to 100℃(Select your desired decimal point from 0, 1, and 2 digits)
Repeatability Within±0.5% of the full scale(in equivalent input)
Linearity Within±0.5% of the full scale(in equivalent input)
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Carbon Sensor Resistivity Meter
(HR-960R-GC)

The HE-960R-GC is a resistivity meter to use glass carbon for its sensor. A glass carbon sensor is not contaminated by metal elution and is chemically resistant to wet cleanig solutions such as hydrofluoric acid and hydrogen peroxide. The carbon surface of its sensor is specially processed so that particle elution is also kept extremely small.
It is especially effective for resistivity measurements in the rinse process of single-bath cleanig system and it enables high quality control in the cleanig process.
- Superior chemical resistance allows for high quality control in single-bath cleanig - Excellent high-speed response - Selectable temperature compensation function - Easy-to-understand icon display and superior security function - 24V DC power source - CE Marking compliant

Measurement method 2-electrode method
Sensor input 1-channel
Cell constant Approx. 0.1/cm
Temperature sensor specifications Platinum resistance 1000Ω/0℃ | Temperature coefficient 3850ppm/℃ standard
Measurement range Resistivity 0~0.200, 0~2.00, 0~20.00, 0~100.0MΩ·cm(0~2.00, 0~20.0, 0~200.0, 0~1000kΩ·m)
* Measurable without temperature compensation
Temperature 0 to 100℃(Select your desired decimal point from 0, 1, and 2 digits)
Repeatability Within±0.5% of the full scale(in equivalent input)
Linearity Within±0.5% of the full scale(in equivalent input)
Conductivity Meter
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Low concentration type Conductivity Meter
(HE-480C-GC)

By employing metal-contamination-free carbon electrodes with high pressure and high chemical resistance, the HE-480C is perfect for measuring conductivity values of various chemical solutions. It has wide uses in the control of concentraction and dilution during semiconductor cleaning processes, and for monitoring the recycling of ultra-pure water. - Perfect for chemical solution measurement and recycle of pure water in semiconductor wet process - Temperature measurement, simultaneous display function - Simultaneous display of measured and set parameter valuse - Easy-to-understand icon display and superior security function - CE Marking compliant

Measurement range 2-electrode method
Cell constant 0.1/cm(ESH-01 Series)
Temperature sensor specifications Platinum resistance 1000Ω/0℃ | Temperature coefficient 3850ppm/℃ standard
Measurement range Resistivity µS/cm : 20.00/200.0 | mS/m : 2.000/20.00
Temperature 0 to 100℃(Selectable from one and two for the number of digits after decimal point)
Repeatability Conductivity diplay Within ±0.5% of full scale
TDS Conversion display Within ±1.5% of full scale
Linearity Conductivity diplay Within ±0.5% of full scale
TDS Conversion display Within ±1.5% of full scale
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Inline Carbon Sensor Conductivity Meter
(HE-960HC)

To maintain concentration and dilution rate of the chemical in Semiconductor and FPD Process, measure a wide range of conductivity with high precision. - Wide range compatibility - Automatic display range switching - Accommodates various types of temperature compensation - Concentration conversion function - Chemical resistant four-electrode carbon sensor

Measurement method 4-electrode carbon flow-type conductivity measurement
Measurement range 0~1000mS/cm
Temperature 0~100℃
Repeatability ±0.5% of the full scale
Linearity ±0.5% of the full scale
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Ideal for TMAH Concentration Monitor
(HE-960H-TM-S)

Accurately measures the concentration of TMAH (Tetra Methyl Ammonium Hydroxide), which is the main component of the photoresist developer solutions in Semiconductor and FPD Process. - High precision. Repeatability: within +/- 0.003% (Up to 10ppm) - A compensation function to minimize the effects of temperature - Enables three types of measurement: TMAH concentration, conductivity, and temperature - Analog output can be distributed freely

Measurement method 4-electrode carbon flow-type conductivity measurement
Measurement range TMAH 0~3wt%
Temperature 0~100℃
Repeatability ±0.5% of the full scale
Linearity ±0.5% of the full scale
O3 Monitor
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Dissolved Ozone Monitor
(HZ-960)

From the perspective of reducing costs and reducing the burden on the environment through chemical-less processes, the use of ozone water is expected to be more and more effective. The HZ-960 is the perfect choice for controlling ozone water concentrations. Two types of detectors are available, a sampling type and inline type, and selectable as appropriate to the equipment environment. - Select various pipe size of detectors Various pipe sizes can be selected. The available detectors have pipe diameters of 1inch, 3/4inch, 1/2inch and 1/4inch. Selectable to fit the application and equipment environment. - Wide measurement range Starting with standard specifications in the 0 to 100mg/L range, the HZ-960 offers 5different measurement ranges, enabling control from low to high concentrations in accordance with the purpose use.(Inline type) - High precision measurement With zero point change stability within ±0.05% FS/day and reproducibility within ±0.2%FS/day, the HZ-960 makes it possible to maintain stabilized ozone water processess.(Inline type) - Remote input and diverse output - Easy-to-understand icon display for indicating instrument status - Preventive of measurement errors and inadvertent operation with supreior security functions - CE Marking compliant

Measurement method UV absorption(254mm)
Measurement range ZH-10 : O3 0~10ppm
ZH-40 : O3 0~40ppm
ZH-100 : O3 0~100ppm
ZH-200 : O3 0~200ppm
ZH-500 : O3 0~500ppm
Repeatability Within ±0.2% of full scale
Linearity Within ±1.0% of full scale
pH Meter
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Industrial pH Meter
(HP-480)

The HP-480 is an industrial strength pH meter perfect for the continuous monitoring of the pH in drainage processes, and delivers preeminent operability and superior cost performance. - Simple calibration procedure: simply submerging the electrode in the standard solution and pressing the CAL and ENT keys - Electrode self-diagnosis function - Delivers both simple and reliable operability - Adopts lead-free solder

Measurement range 0.00~14.00pH | Temperature: 0~100℃
Repeatability ±0.05pH
Transmission output DC4~20mA (isolated input/output type)
Power supply AC 100~240V ± 10%
pH Electrodes Model 6108-50B
Temperature range 0~100℃
Wetted material Ceramic
Cable length 5M
Particle Detection System
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PR-PD2

- 0.35μm detaction sensitivity, 93% detection rate. - Easy operation with flexible inspection menu. - Automatic loading of up to 10 reticles directly from reticle cases in our multistage sorter. (depending on case type.) - It is possible to obtain direct observations of both the reticle and mask surfaces (glass and pattern sufaces.) - Particles mapped on MS Windows NT, convenient data management for report production. - Reduce inspection errors using the New Single Process Method.

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PR-PD2HR

- Can detect particles as small as 0.35μm - Use of exclusive signal processing to evaluate laser scattering enables detection of contaminant particles as small as 0.35μm. - Pattern discrimination of 1μm line and space on the reticle or mask means that erroneous detection is minimized. - Multi-stage sorter handles any type of stepper case. In addition to the stepper case, the ten-stage sorter can also handle SMIF pods. - A mix of different-sized stepper cases from different makers can be loaded.

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PR-PD3

- The compact design boasts a footprint one half that of the PR-PD2. Taking up less valuable clean room space, the PR-PD3 can be arranged freely, even with the addition of an operation unit(option). - Low maintenance and operating costs. Maintenance and operating costs have been reduced by using a highly economical He-Ne laser and simply designed inspection loader/stage unit. - Effective function for countering erroneous detection. The PR-PD3 is equipped with both a polarized differential function for coarse patterns and a low-pass difference function for fine patterns. Utilizing these two methods, erroneous detection can be effectively countered in OPC patterns, etc., that have both characteristics.

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PR-PD5

- Automatic coordinate compensation function - Three transmissive photoelectric sensors detect reticle edges. - Positional deviation of the reticle on the fork is automatically corrected. - Displayed results are always based on coordinates taken from the reticle edges. - Reticle inversion mechanism - 0.5 t0 50μm selectable - Single detection system - Built-in and combination types - Various reports can ber output using the data management function.

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Reticle/Mask Particle Remover(RP-1)

Automatically removes particles by blow and vacuum suction
Automatically removes particles from the reticle/mask by air(or N2)blow and vacuum suction.
Removal of particles by routine use before lithogrphy process extends the replacement cycle of the pellicle and cleaning of the mask, thereby contributing to a reduction in running costs.

If you want to pruchase and have any questions please feel free to contact +82-31-781-0033 or email

E-Mail : swkim@ktsemi.co.kr